首页> 外国专利> SELF-ALIGNED TRENCH FIELD EFFECT TRANSISTORS WITH REGROWN GATES AND BIPOLAR JUNCTION TRANSISTORS WITH REGROWN BASE CONTACT REGIONS AND METHODS OF MAKING

SELF-ALIGNED TRENCH FIELD EFFECT TRANSISTORS WITH REGROWN GATES AND BIPOLAR JUNCTION TRANSISTORS WITH REGROWN BASE CONTACT REGIONS AND METHODS OF MAKING

机译:带再生基接触区的自对准沟槽场效应晶体管和具有再生基接触区的双极结型晶体管及其制造方法

摘要

vertical channel and having a junction gate type field effect transistor self-aligned regrowth and a method of manufacturing such a device is described. How are the growth of the semiconductor material and optionally and / or selectively removed by use of a technique of forming a pn junction in a bottom surface of the trench gate and the source of separating fingers along the side portions of the channel . Method for producing a bipolar junction transistor , and such an apparatus having a self-aligned base contact region is described also re-growth . The semiconductor device can be manufactured in the silicon carbide .
机译:描述了一种具有垂直沟道并具有结栅型场效应晶体管自对准再生长的垂直沟道及其制造方法。怎样通过在沟槽栅极的底表面和沿沟道侧面的分离指的源中形成pn结的技术去除和选择性地去除半导体材料的生长。还描述了用于生产双极结型晶体管的方法以及具有自对准基极接触区的这种设备。半导体器件可以用碳化硅制造。

著录项

  • 公开/公告号KR101318041B1

    专利类型

  • 公开/公告日2013-10-14

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20087016400

  • 发明设计人 산킨 이고르;메렛 조세프 네일;

    申请日2006-12-04

  • 分类号H01L29/737;H01L29/808;

  • 国家 KR

  • 入库时间 2022-08-21 16:24:19

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