Apparatus for chemical vapor deposition for diamond film and method for synthesis of diamond film

摘要

The invention and suppresses the increase of the substrate temperature as in the synthesis of diamond by a chemical vapor deposition process At the same time the diamond relates to the synthesis gas or ion of a diamond synthesis method using chemical vapor deposition apparatus for diamond synthesis and it can increase the growth rate of the diamond by increasing the degree of activation, chemical vapor deposition for diamond synthesis according to the invention device includes a chamber in which the process is a chemical vapor deposition process, is provided in the chamber, the substrate to provide a growth area of the diamond, and is made including a heat block structure provided in the spaced position above the substrate, the heat block structure characterized by an opening which can be a precursor gas is moving. ;