首页> 外国专利> METHOD TO TEST SEMICONDUCTOR CMOS/SOI OF LSI TECHNOLOGY FOR RESISTANCE TO EFFECTS OF SINGLE FAILURES FROM IMPACT OF HEAVY CHARGED PARTICLES OF SPACE

METHOD TO TEST SEMICONDUCTOR CMOS/SOI OF LSI TECHNOLOGY FOR RESISTANCE TO EFFECTS OF SINGLE FAILURES FROM IMPACT OF HEAVY CHARGED PARTICLES OF SPACE

机译:一种测试LSI技术的半导体CMOS / SOI的方法,该方法可抵抗由空间的带电粒子撞击引起的单个失效的影响

摘要

FIELD: testing equipment.;SUBSTANCE: in the method for testing of semiconductor CMOS/SOI of LSI technology for resistance to effects of single faults from impact of heavy charged particles (HCP) of space by means of radiation of a limited LSI sample with pulse ionising radiation, radiation is produced by gamma-neutron radiation of a pulse nuclear reactor (PNR) with average energy of 1.0-3.0 MeV or pulse X-ray radiation of electrophysical plants (EPP) with an equivalent dose, causing generation of a radiation-induced charge equal with HCP in the sensitive LSI volume, and for detection of resistance to HCP impact with the threshold value of linear losses of energy LETth in the range from units to a hundred of MeV·cm2/mg, the value of coefficient of relative efficiency RDEF (Relative Dose Enhancement Factor) is used on impact of full absorbed dose of X-ray or gamma-radiation in respect to the LHTTH value using the provided ratio.;EFFECT: reduced cost and duration of tests for radiation resistance, higher reliability of test results.;7 cl, 6 dwg, 8 tbl
机译:技术领域:测试设备;实质:在LSI技术的半导体CMOS / SOI的测试方法中,通过有限的LSI样品的脉冲辐射来抵抗空间的重电荷粒子(HCP)撞击所引起的单个故障的影响电离辐射,辐射是由平均能量为1.0-3.0 MeV的脉冲核反应堆(PNR)的伽马中子辐射或等效剂量的电物理植物(EPP)的脉冲X射线辐射产生的,从而产生了辐射-在灵敏的LSI体积中感应电荷等于HCP,并且用于检测对HCP的抗性,能量LETth的线性损耗阈值在单位MeV·cm 2 / mg,相对有效系数RDEF(相对剂量增​​强因子)的值使用所提供的比率对LHTTH值对X射线或伽马射线的全部吸收剂量的影响。;效果:降低成本和持续时间r的测试耐添加性,测试结果可靠性更高;; 7 cl,6 dwg,8 tbl

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号