首页> 外国专利> Device for wet treatment of substrate wafer used in photovoltaic industry, has conveying elements that lies outside pools for conveying substrate wafer, so that process fluid contacts with underside of substrate wafer

Device for wet treatment of substrate wafer used in photovoltaic industry, has conveying elements that lies outside pools for conveying substrate wafer, so that process fluid contacts with underside of substrate wafer

机译:光伏工业中用于湿法处理衬底晶片的设备,其输送元件位于用于输送衬底晶片的池外,从而使处理液与衬底晶片的底面接触

摘要

The device (1) has several pools (5) with an inlet (11) for introducing a process fluid. A transport unit (7) transports the substrate wafers arranged one behind the other in the transport direction (A) of the transport unit over the pools. The transport unit has conveying elements that lies outside the pools for conveying the substrate wafer, so that the process fluid contacts with the underside of the substrate wafer. An independent claim is included for a method for wet treatment of substrate wafer.
机译:装置(1)具有多个池(5),池(5)具有用于引入过程流体的入口(11)。运送单元(7)在池上运送沿运送单元的运送方向(A)一个接一个地布置的基板晶片。输送单元具有位于池外部的输送元件,用于输送衬底晶片,使得处理流体与衬底晶片的底面接触。包括对基板晶片的湿法处理的独立权利要求。

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