首页> 外国专利> Vacuum-substrate treatment plant for plate-shaped substrates, has vacuum chamber with valve for inserting substrate in vacuum chamber, where guiding unit is arranged at outer side of vacuum chamber in area of valve with guiding elements

Vacuum-substrate treatment plant for plate-shaped substrates, has vacuum chamber with valve for inserting substrate in vacuum chamber, where guiding unit is arranged at outer side of vacuum chamber in area of valve with guiding elements

机译:用于板状衬底的真空衬底处理设备,具有带阀的真空室,用于将衬底插入真空室中,其中引导单元布置在真空室的外侧,在带引导元件的阀区域中

摘要

The vacuum-substrate treatment plant has a vacuum chamber with a slot-shaped valve for inserting plate-shaped substrate (8) in the vacuum chamber, where a guiding unit is arranged at the outer side of the vacuum chamber in the area of the slot-shaped valve with two guiding elements (5). Each guiding element is arranged at an end of the slot-shaped valve, so that the plate-shaped substrate is inserted in the center in the slot-shaped substrate. The guiding elements have an insertion bevel on their sides facing away from the slot-shaped valve.
机译:真空基板处理设备具有一个带有槽形阀的真空腔,用于将板形基板(8)插入真空腔中,在该腔的区域中,在真空腔的外侧布置有导向单元带两个导向元件(5)的异型阀。每个引导元件布置在槽形阀的端部,使得板状基板被插入在槽形基板的中央。导向元件在其背向槽形阀的侧面上具有插入斜面。

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