首页> 外国专利> Transistor i.e. hot-carrier-injection metal-oxide-semiconductor transistor, for e.g. integrated circuit of contact smartcard, has gate including non-planar surface having non-zero component part in direction perpendicular to substrate

Transistor i.e. hot-carrier-injection metal-oxide-semiconductor transistor, for e.g. integrated circuit of contact smartcard, has gate including non-planar surface having non-zero component part in direction perpendicular to substrate

机译:晶体管,例如热载流子注入金属氧化物半导体晶体管,例如。接触式智能卡的集成电路,其栅极包括在垂直于基板的方向上具有非零组成部分的非平面表面

摘要

The transistor (20) has source and drain regions in a substrate (21), and a floating gate (24) made of a conducting material and located above the substrate in an isolated manner. The gate includes a non-planar surface having a part with a non-zero component in a direction perpendicular to the substrate. The gate includes a branch directed along direction perpendicular to the substrate. The gate is separated from the substrate by an insulating element i.e. tunnel (27), and separated from a control gate (25) by an insulating layer (29). Independent claims are also included for the following: (1) an electrically programmable non-volatile memory (2) a method for manufacturing a transistor (3) a method for manufacturing an electrically programmable non-volatile memory.
机译:晶体管(20)在衬底(21)中具有源极和漏极区域,以及由导电材料制成并且以隔离的方式位于衬底上方的浮栅(24)。栅极包括非平面表面,该非平面表面的一部分在垂直于基板的方向上具有非零分量。栅极包括沿垂直于衬底的方向定向的分支。栅极通过绝缘元件即隧道(27)与衬底隔开,并且通过绝缘层(29)与控制栅极(25)隔开。还包括以下各项的独立权利要求:(1)电可编程非易失性存储器(2)制造晶体管的方法(3)制造电可编程非易失性存储器的方法。

著录项

  • 公开/公告号FR2980638A1

    专利类型

  • 公开/公告日2013-03-29

    原文格式PDF

  • 申请/专利权人 STMICROELECTRONICS (ROUSSET) SAS;

    申请/专利号FR20110058536

  • 发明设计人 BOIVIN PHILIPPE;NIEL STEPHAN;

    申请日2011-09-26

  • 分类号H01L21/335;H01L21/8238;H01L21/8247;

  • 国家 FR

  • 入库时间 2022-08-21 16:21:02

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