METHOD OF CORRECTING DEFECT OF PHOTOMASK, PHOTOMASK PRODUCTION METHOD AND PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a convenient method of correcting deletion defects of a quartz substrate of a photomask which achieves a phase effect and a transmission factor of a corrected part nearly equal to those of normal parts of the quartz substrate, a photomask production method including the correction method and a photomask.;SOLUTION: A method of correcting defects of a photomask is for correcting deletion defect parts of a quartz substrate of a photomask which is formed with a specified pattern on the quartz substrate and includes a step of depositing an electron beam CVD film in the deletion defect parts to fill the deletion defect parts and a step of grinding the deposited electron beam CVD film by using a probe of an atomic force microscope to reduce irregularities of the surface of the CVD film to 5 nm or smaller.;COPYRIGHT: (C)2014,JPO&INPIT