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WASTE GAS TREATMENT SYSTEM AND WASTE GAS TREATMENT METHOD OF CHLOROSILANE

机译:氯硅烷的废气处理系统及废气处理方法

摘要

PROBLEM TO BE SOLVED: To provide a technology for reducing a used amount of an absorbent for chlorosilane waste gas, dilution water of the absorbent and a waste water neutralizer.;SOLUTION: A waste water flow passage is formed so that a processing liquid flows to a downstream side scrubber from an upstream side scrubber in a predetermined overflow amount by a height difference of a processing liquid surface in a chemical tank between the mutual adjacent scrubbers of a plurality of scrubbers 10a-c. The respective scrubbers are provided with a waste gas introduction part 12 of chlorosilane, a pH gauge 13 for managing a hydrogen ion concentration index of the processing liquid in the chemical tank and an absorbent supply part 14 of the chlorosilane waste gas for setting a pH value of the processing liquid in the chemical tank to 11 or more. While, a dilution liquid supply part for adjusting the concentration of the absorbent in the chemical tank of the most upstream scrubber and forming an overflow of the processing liquid, is provided only in the most upstream scrubber 10a. The absorbent supplied to the most upstream scrubber 10a can be used even for the downstream side scrubbers 10b and c.;COPYRIGHT: (C)2014,JPO&INPIT
机译:解决的问题:提供一种减少氯硅烷废气吸收剂的使用量,吸收剂的稀释水和废水中和剂的技术。解决方案:形成废水流道,使处理液流向下游侧洗涤器从上游侧洗涤器以预定溢流量,通过多个洗涤器10a-c的彼此相邻的洗涤器之间的化学槽中的处理液表面的高度差而预定。各个洗涤器设置有氯硅烷的废气引入部12,用于管理化学罐中的处理液的氢离子浓度指数的pH计13以及用于设定pH值的氯硅烷废气的吸收剂供给部14。化学槽中的处理液的数量达到11个或更多。同时,仅在最上游的洗涤器10a中设置有稀释液供应部,该稀释液供应部用于调节最上游的洗涤器的化学槽中的吸收剂的浓度并形成处理液的溢流。供应到最上游洗涤塔10a的吸收剂甚至可以用于下游侧洗涤塔10b和c;版权所有:(C)2014,JPO&INPIT

著录项

  • 公开/公告号JP2014140786A

    专利类型

  • 公开/公告日2014-08-07

    原文格式PDF

  • 申请/专利权人 SHIN ETSU CHEM CO LTD;

    申请/专利号JP20130008999

  • 发明设计人 NAGAI NAOKI;TANAKA HIDEJI;KOYAMA AKIRA;

    申请日2013-01-22

  • 分类号B01D53/68;B01D53/77;B01D53/70;B01D53/14;B01D53/46;B01D53/72;

  • 国家 JP

  • 入库时间 2022-08-21 16:17:43

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