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METHOD FOR MEASURING PLANE ORIENTATION OF SINGLE CRYSTAL SUBSTRATE COMPRISING UNIAXIAL CRYSTAL, AND DEVICE FOR MEASURING PLANE ORIENTATION USED FOR THE METHOD
METHOD FOR MEASURING PLANE ORIENTATION OF SINGLE CRYSTAL SUBSTRATE COMPRISING UNIAXIAL CRYSTAL, AND DEVICE FOR MEASURING PLANE ORIENTATION USED FOR THE METHOD
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机译:包含单轴晶体的单晶基质的平面取向的测量方法,以及用于该方法的平面取向的测量装置
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摘要
PROBLEM TO BE SOLVED: To provide a method by which a plane orientation of a single crystal substrate comprising a uniaxial crystal can be accurately and easily measured by an optical process without using an X-ray diffraction method, and the plane orientation can be measured without restrictions in thickness of the substrate or plane orientations thereof.SOLUTION: A method for measuring a plane orientation of a single crystal substrate comprising a uniaxial crystal is provided, using such a property that when light in a given direction is made to be incident to the single crystal substrate comprising a uniaxial crystal, a refractive index for the light is a synthesized value of refractive indices specific to the crystal main axis and is turned to be a function of an incident direction of the light. The method is carried out through two separated steps of measurement: a step of measuring an inclination orientation of the crystal main axis to the original flat orientation of the substrate; and a step of measuring an inclination angle of the crystal main axis with respect to the normal direction of the substrate.
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