Method of cleaning a surface of the substrate using a hot wire chemical vapor deposition (HWCVD) chambers

摘要

Method of cleaning a surface of the substrate using a hot wire chemical vapor deposition (HWCVD) chambers are provided herein . In some embodiments , the method of cleaning the surface of the substrate , and to provide a substrate having a material which is placed on the surface of the substrate in hot wire chemical vapor deposition (HWCVD) chambers , hydrogen (H ₂) and to supply gas to HWCVD chamber , hydrogen (H ₂) placed HWCVD chamber to a temperature sufficient to dissociate the gas and to heat one or more filaments are , dissociated hydrogen (H ₂) and exposing the substrate to a gas , at least some of the surface of the substrate material it is possible to include and removing . [ Selection Figure ] Figure 1