METHODS FOR CLEANING A SURFACE OF A SUBSTRATE USING A HOT WIRE CHEMICAL VAPOR DEPOSITION HWCVD CHAMBER

摘要

Methods for cleaning the surface of a substrate using a hot wire chemical vapor deposition (HWCVD) chamber are provided herein. In some embodiments, a method for cleaning a surface of a substrate includes providing a substrate to a hot-wire chemical vapor deposition (HWCVD) chamber wherein the material is disposed on a surface of the substrate; Providing a hydrogen (H ₂ ) gas to the HWCVD chamber; Heating the one or more than one filament disposed on HWCVD chamber to a temperature sufficient to dissociate the hydrogen (H ₂₎ gas; And exposing the substrate to dissociated hydrogen (H ₂ ) gas to remove at least a portion of the material from the surface of the substrate.