FPD device manufacturing mask blank, photomask, and method of designing the FPD device manufacturing mask blank

摘要

PROBLEM TO BE SOLVED: To provide a mask blank and a photomask which are suitable to processes (a drawing method and a resist coating method) of a large-sized mask for FPD and different conditions (the kind of resist and resist film thickness).;SOLUTION: There is provided a mask blank for FPD device manufacture which at least has a light shield film on a translucent substrate and is used to form a resist film for laser drawing on the light shielding film by a slit coater device. The light shielding film is controlled to have a width of variation in film surface reflection factor within a range of less than 2% in a wavelength band of 350-450 nm including a laser drawing wavelength. The slit coater device forms the resist film by moving a nozzle, having a resist liquid supply port extending in one direction, relatively to a top surface of the light shielding film in a direction crossing the one direction while discharging the resist liquid from the nozzle.;COPYRIGHT: (C)2012,JPO&INPIT