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Production method of the support baseplate and the said support baseplate and the support baseplate which is used for the production methodological

机译:支撑基板的制造方法以及上述支撑基板和用于该制造方法的支撑基板

摘要

PROBLEM TO BE SOLVED: To minimize a relative position displacement between the bottom layer and the top layer of laminated wiring layers.;SOLUTION: A support substrate 10 is prepared in which openings OP1, OP3, OP5 are formed at a peripheral part R2 of a surface on the side of laminating the wiring layers and light irradiation members 20a, 20c, 20e for directing irradiation light from the outside to the openings are provided on a part continued to a side end face. Then, after formation of an insulating layer 34 on the surface on the side where the openings are formed of the support substrate 10, a wiring layer 35 is formed in a region R1 on the inner side of the peripheral part on the insulating layer, and a plurality of alignment marks M1, M3, M5 are formed in a region corresponding to the positions where the openings are formed. When forming a via hole in the insulating layer or the like in the succeeding process, a corresponding alignment mark among the plurality of alignment marks is detected by the light made to pass through the openings by using the light irradiation member, and positioning is performed with the detected mark as a position reference.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:为了最小化层压布线层的底层和顶层之间的相对位置位移。解决方案:准备支撑衬底10,其中在衬底的外围部分R2上形成开口OP1,OP3,OP5。在层叠布线侧的侧面上,在与侧面端面连续的部分上设置有用于将来自外部的照射光引导至开口的光照射部件20a,20c,20e。然后,在支撑基板10的形成有开口的一侧的表面上形成绝缘层34之后,在绝缘层上的外围部分的内侧的区域R1中形成布线层35,并且在与形成开口的位置相对应的区域中形成多个对准标记M1,M3,M5。当在随后的步骤中在绝缘层等中形成通孔时,通过使用光照射构件,通过穿过开口的光来检测多个对准标记中的对应对准标记,并利用检测到的标记作为位置参考。;版权:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP5501204B2

    专利类型

  • 公开/公告日2014-05-21

    原文格式PDF

  • 申请/专利权人 新光電気工業株式会社;

    申请/专利号JP20100270312

  • 发明设计人 国本 裕治;

    申请日2010-12-03

  • 分类号H05K3/46;H05K3/00;H05K1/02;

  • 国家 JP

  • 入库时间 2022-08-21 16:14:01

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