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The processing tube which accommodates the baseplate support component which it supports production method of the baseplate

机译:容纳用于支撑基板的制造方法的基板支撑部件的处理管

摘要

PROBLEM TO BE SOLVED: To improve a uniformity of a thickness of a thin film formed on a substrate.;SOLUTION: A substrate processing system is provided with: a processing tube accommodating a substrate support member which holds vertically laminated substrates at a predetermined pitch; a gas feeding unit which is extended in the direction of laminating the substrates in the processing tube and is provided with plural gas supply apertures; a gas discharge portion which is opened to the processing tube; a gas straightening vane which is provided in a space sandwiched between peripheries of the substrates held by the substrate support member and an inner wall of the processing tube and is extended in the circumference direction of the processing tube from the gas feeding unit and in the direction of laminating the substrates; and a gas stream regulation part provided in a space in the processing tube above the highest gas feeding aperture and the highest substrate and in a space in the processing tube below the lowest gas feeding aperture and the lowest substrate.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:为了提高在基板上形成的薄膜的厚度的均匀性。解决方案:基板处理系统具有:处理管,其容纳基板支撑构件,该基板支撑构件以预定的间距保持垂直层叠的基板;气体供给单元,其在处理管中的基板的层叠方向上延伸,并具有多个气体供给口。排气部向处理管开口。气体矫正叶片,该气体矫正叶片设置在夹在由基板支撑部件保持的基板的周边与处理管的内壁之间的空间中,并在处理管的圆周方向上从气体供给单元沿其方向延伸。层压基板;气流调节部设置在处理管中最高供气口和最高基板上方的空间以及处理管中最低供气口和最低基板下方的空间。COPYRIGHT:(C)2009 ,JPO&INPIT

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