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High throughput deposition system for growing an oxide thin film by reactive co-evaporation
High throughput deposition system for growing an oxide thin film by reactive co-evaporation
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机译:用于通过反应共蒸发生长氧化物薄膜的高通量沉积系统
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摘要
A heater for growing a thin film on a substrate received in the substrate support member has a plurality of heating elements. A substrate support member for accommodating the substrate is at least partially surrounded by a plurality of heating elements. 2, to provide external access to the substrate support member, at least one of the plurality of heating elements are moveable with respect to each other. Oxygen pocket is formed on the oxygen pocket member or another one of the heating element, is used to oxidize the film on the substrate the oxygen pocket. [Selection] Figure Figure 1
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