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Either rustproofing or silane coupling medicine processing finishing of 1 kinds

机译:1种防锈或硅烷偶联剂的加工完成

摘要

PROBLEM TO BE SOLVED: To provide a surface treated electrolytic copper foil which has a low profile on an equal or higher level as compared with a low-profile surface treated electrolytic copper foil which has been supplied on the conventional market and is small in waviness which affects the linearity of wiring, and to provide a process for producing the surface treated electrolytic copper foil.;SOLUTION: In the surface treated electrolytic copper foil, on the face of adhesion to an insulating layer constituent material, the maximum level difference of elevation of waviness (Wmax) is 0.05 μm to 0.7 μm, the maximum difference of elevation of irregularities (PV) is 0.05 to 1.5 μm, and the surface roughness (Rzjis) is 0.1 μm to 1.0 μm. The electrolytic copper foil used in the production of the surface treated electrolytic copper foil is produced by electrolysis under electrolytic conditions of current density on at least two different levels from continuous first step electrolysis to nth step electrolysis, using a sulfuric acid-based copper electrolysis solution, prepared by adding 3-mercapto-1-propanesulfonic acid or bis(3-sulfopropyl)disulfide, a quaternary ammonium salt polymer having a cyclic structure, and chlorine, and by using a cathode having a small surface roughness.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供一种表面处理的电解铜箔,其与在常规市场上供应的低轮廓的表面处理的电解铜箔相比,具有相等或更高水平的低轮廓。影响布线的线性度,并提供一种生产表面处理过的电解铜箔的方法。;解决方案:在表面处理过的电解铜箔中,在与绝缘层组成材料的粘合面上,最大仰角差为波纹度(Wmax)为0.05μm至0.7μm,凹凸不平度(PV)的最大差为0.05至1.5μm,表面粗糙度(Rzjis)为0.1μm至1.0μm。用于表面处理的电解铜箔的制造中的电解铜箔是使用硫酸系铜电解溶液,在电流密度的电解条件下,从连续的第一步电解至第n步电解,在至少两个不同的水平上进行电解而制备的。通过添加3-巯基-1-丙磺酸或双(3-磺丙基)二硫化物,具有环状结构的季铵盐聚合物和氯气,并使用具有较小表面粗糙度的阴极制备; COPYRIGHT:(C )2013年,日本特许厅&INPIT

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