Pretreatment method in chamber, plasma treatment method, and storage medium in plasma nitriding treatment

摘要

Disclosed is an in-chamber preprocessing method for carrying out preprocessing in a chamber prior to carrying out plasma nitridation processing of an oxide film, formed on a substrate, in the chamber. The method includes a step of supplying an oxygen-containing processing gas into the chamber and converting the gas into plasma, thereby generating an oxidizing plasma in the chamber (step 1), and a step of supplying a nitrogen-containing processing gas into the chamber and converting the gas into plasma, thereby generating a nitriding plasma in the chamber (step 2).