Production method of half-tone type EUV mask and half-tone type EUV mask

摘要

PROBLEM TO BE SOLVED: To provide a halftone EUV (extreme ultraviolet) mask, in which a halftone membrane material is selected so as to reduce a shadowing effect while ensuring wide selectivity (flexibility) of reflectance and high detergent resistance, a halftone EUV mask blank, a manufacturing method of halftone EUV mask, and a pattern transfer method.;SOLUTION: The halftone EUV mask is provided with a substrate, a high reflection part formed on the substrate, and a low reflection part formed by patterning on the high reflection part. The low reflection part includes Ta (tantalum), Mo (molybdenum) and Si (silicon).;COPYRIGHT: (C)2009,JPO&INPIT