Especially, being the optical system which possesses the optical system null

摘要

PROBLEM TO BE SOLVED: To provide the optical system of microlithography projection exposure apparatus which allows flexible setting of a different polarization distribution including a tangential/radial mixed polarization distribution.;SOLUTION: A polarization-influencing optical device 150 includes at least one polarization-influencing optical element 200 composed of an optically active material having an optical crystal axis and having a thickness profile changing in the direction of optical crystal axis, at least one λ/2 plate 250, at least one rotor 240 which brings about rotation of a fixed polarization rotation angle in the polarization direction of light incident onto the rotor 240, and an actuator device capable of moving the λ/2 plate 250 and the rotor 240 independently from each other between a position on the inside of an optical beam path and a position on the outside thereof.;COPYRIGHT: (C)2014,JPO&INPIT