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The colloidal silica where the mean diameter which is calculated from the specific surface which was measured chemical machine grinding method null

机译:从化学机械研磨法测定的比表面积算出的平均粒径的胶体二氧化硅无效

摘要

As for the chemical machine grinding service water type dispersing element which relates to this invention, as for the mean diameter which is calculated from the specific surface which was measured (A) making use of BET method, the colloidal silica which is 10nm - 60nm and, (B) the organic acid which possesses the carboxyl group of two or more and the hydroxyl basis of one or more inside the monad and, (C) are shown with the below-mentioned general formula (1) four class ammonium compounds which and, it includes, at the same time, pH is 3 - 5. Conversion 5 ((1) in formula, R1 or R4, independently, displays the hydrocarbon radical. M - displays the anion.)
机译:本发明涉及的化学机械研磨用水系分散元素,由使用BET法由(A)测定的比表面积算出的平均直径为10nm〜60nm,且为10nm〜60nm。在下述通式(1)中,(B)表示具有两个以上的羧基和一个或多个羟基的有机酸的有机酸,(C)由下述通式(1)表示的四类铵化合物: ,同时包含pH为3-5。<转换5>((1)在公式中,R 1 或R 4 分别显示烃基。M-显示阴离子。

著录项

  • 公开/公告号JP5403262B2

    专利类型

  • 公开/公告日2014-01-29

    原文格式PDF

  • 申请/专利权人 JSR株式会社;

    申请/专利号JP20090506244

  • 申请日2008-02-20

  • 分类号H01L21/304;B24B37/00;C09K3/14;

  • 国家 JP

  • 入库时间 2022-08-21 16:11:24

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