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The uniform angular distribution generation device null entrance place

机译:均匀角度分布产生装置零位

摘要

PROBLEM TO BE SOLVED: To vary the size of a work surface by achieving variable angular distribution.;SOLUTION: An apparatus for generating an angular distribution is equipped with: a first homogenisation unit 10 equipped with a first substrate 1 having an incident surface and an emitting surface and a first lens array 4 through which the laser irradiation 17 can pass and which is formed on the incident surface and/or the emitting surface; and a second homogenisation unit 11 equipped with a second substrate 2 having an incident surface and an emitting surface and a second lens array 5 through which the laser irradiation 17 emitted from the first lens array 4 can pass and which is formed on the incident surface and/or the emitting surface. The laser irradiation 17, after exiting from the second homogenisation unit 11, has a comparably homogeneous angular distribution. The second homogenisation unit 11 has a third substrate 3 having an incident surface and an emitting surface further and a third lens array 6 formed on the incident surface and/or the emitting surface while leaving space from the second lens array 5. The distances d1 and d2 between the second and the third substrates 2 and 3 influence the angular distribution.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:通过实现可变的角度分布来改变工作表面的尺寸。解决方案:用于产生角度分布的设备配备有:第一均质化单元10,其配备有具有入射表面的第一基板1和一个发射表面和第一透镜阵列4,激光辐射17可以穿过该第一透镜阵列,并形成在入射表面和/或发射表面上;第二均质化单元11配备有具有入射表面和出射表面的第二基板2以及第二透镜阵列5,第二透镜阵列5形成为从第一透镜阵列4发射的激光辐射17穿过该第二透镜阵列5,并且该第二透镜阵列5形成在入射表面上。 /或发射表面。从第二均化单元11出来的激光辐射17具有相对均一的角分布。第二均质化单元11具有:第三基板3,其具有入射面和出射面;以及第三透镜阵列6,其形成在入射面和/或出射面上,同时与第二透镜阵列5之间留有空间。第二和第三基板2和3之间的Sub> 1 和d 2 影响角度分布。COPYRIGHT:(C)2008,JPO&INPIT

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