首页> 外国专利> METHOD, SYSTEM AND SOFTWARE FOR ACCESSING DESIGN RULES AND LIBRARY OF DESIGN FEATURES WHILE DESIGNING SEMICONDUCTOR DEVICE LAYOUT

METHOD, SYSTEM AND SOFTWARE FOR ACCESSING DESIGN RULES AND LIBRARY OF DESIGN FEATURES WHILE DESIGNING SEMICONDUCTOR DEVICE LAYOUT

机译:在设计半导体器件布局时访问设计规则和设计特征库的方法,系统和软件

摘要

Provided is a system and method for designing the layout of integrated circuits or other semiconductor devices while directly accessing design rules and a library of design features by interfacing with a GUI upon which the design layout is displayed. The design rules may be directly linked to the design features of the pattern library and imported into the device layout. The design rules may be directly accessed while designing the layout or while conducting a design rule check and the design features from the pattern library may be used in creating the layout.
机译:提供一种用于设计集成电路或其他半导体器件的布局,同时通过与在其上显示设计布局的GUI接口直接访问设计规则和设计特征库的系统和方法。设计规则可以直接链接到模式库的设计特征,并导入到设备布局中。在设计布局时或进行设计规则检查时,可以直接访问设计规则,并且可以将样式库中的设计特征用于创建布局。

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