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Customizing Etch Selectivity with Sequential Multi-Stage Etches with Complementary Etchants
Customizing Etch Selectivity with Sequential Multi-Stage Etches with Complementary Etchants
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机译:使用具有互补蚀刻剂的顺序多阶段蚀刻来定制蚀刻选择性
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摘要
A method of combinatorial processing involving etching a first material and a second material on a substrate comprising: etching the first material with a high first etch rate with a first etchant; etching the second material with a high second etch rate with a second etchant, wherein the first etchant and the second etchant are used sequentially without being separated by a rinse.
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