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THERMAL ANNEAL OF BLOCK COPOLYMER FILMS WITH TOP INTERFACE CONSTRAINED TO WET BOTH BLOCKS WITH EQUAL PREFERENCE
THERMAL ANNEAL OF BLOCK COPOLYMER FILMS WITH TOP INTERFACE CONSTRAINED TO WET BOTH BLOCKS WITH EQUAL PREFERENCE
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机译:嵌段共聚物薄膜的热退火,其顶部界面被约束以润湿具有相同优先级的两个嵌段
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摘要
Methods for fabricating sub-lithographic, nanoscale microstructures utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
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