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Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
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机译:具有顶部界面的嵌段共聚物薄膜的热退火被约束为以相同的优先权润湿两个嵌段
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摘要
Methods for fabricating sub-lithographic, nanoscale microstructures utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
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