首页> 外国专利> METHOD FOR PREDICTING PLASMA MICRO-ARCING, AND METHOD FOR CONTROLLING PLASMA PROCESS OF PRODUCTION EQUIPMENT USING THE SAME

METHOD FOR PREDICTING PLASMA MICRO-ARCING, AND METHOD FOR CONTROLLING PLASMA PROCESS OF PRODUCTION EQUIPMENT USING THE SAME

机译:等离子体微弧的预测方法以及使用该方法控制生产设备的等离子体过程的方法

摘要

A method for predicting plasma micro-arcing includes obtaining a spectrum signal in a given plasma process, classifying an optical intensity of the spectrum signal into soft and hard arcing events according to an amplitude of the optical intensity of the spectrum signal, separately counting a number of occurrences of the soft arcing event in a given unit time, comparing the number of occurrences of the soft arcing event during the given unit time with the number of occurrences of the soft arcing event during a previous unit time, and determining that a number of occurrences of the hard arcing event will increase during a next unit time subsequent to the given unit time, when the number of occurrences of the soft arcing event during the given unit time increases in comparison with the number of occurrences of the soft arcing event during the previous unit time.
机译:一种预测等离子体微弧的方法,包括在给定的等离子体过程中获得光谱信号,根据光谱信号的光强度的幅度将光谱信号的光强度分为软和硬电弧事件,分别计数比较给定单位时间内的软电弧事件的发生次数,将给定单位时间内的软电弧事件的发生次数与先前单位时间内的软电弧事件的发生次数进行比较,并确定与给定单位时间内软电弧事件的发生次数相比,给定单位时间内软电弧事件的发生次数增加时,在给定单位时间之后的下一个单位时间内,硬电弧事件的发生次数将增加。以前的单位时间。

著录项

  • 公开/公告号US2014209453A1

    专利类型

  • 公开/公告日2014-07-31

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号US201314144844

  • 发明设计人 JINO PARK;TAERANG KIM;HYUN SU JUN;

    申请日2013-12-31

  • 分类号H01J37/32;G01J1/44;

  • 国家 US

  • 入库时间 2022-08-21 16:07:50

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号