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METHOD FOR PREDICTING PLASMA MICRO-ARCING, AND METHOD FOR CONTROLLING PLASMA PROCESS OF PRODUCTION EQUIPMENT USING THE SAME
METHOD FOR PREDICTING PLASMA MICRO-ARCING, AND METHOD FOR CONTROLLING PLASMA PROCESS OF PRODUCTION EQUIPMENT USING THE SAME
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机译:等离子体微弧的预测方法以及使用该方法控制生产设备的等离子体过程的方法
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摘要
A method for predicting plasma micro-arcing includes obtaining a spectrum signal in a given plasma process, classifying an optical intensity of the spectrum signal into soft and hard arcing events according to an amplitude of the optical intensity of the spectrum signal, separately counting a number of occurrences of the soft arcing event in a given unit time, comparing the number of occurrences of the soft arcing event during the given unit time with the number of occurrences of the soft arcing event during a previous unit time, and determining that a number of occurrences of the hard arcing event will increase during a next unit time subsequent to the given unit time, when the number of occurrences of the soft arcing event during the given unit time increases in comparison with the number of occurrences of the soft arcing event during the previous unit time.
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