Photomask having patterns for EUV light and DUV light

摘要

A photomask, including a photomask substrate, a reflective layer on a front surface of a first region of the photomask substrate, the reflective layer being configured to reflect an EUV light, an absorbing pattern on the reflective layer, the absorbing pattern being configured to absorb the EUV light, and an opaque pattern directly on a front surface of a second region of the photomask substrate, the opaque pattern being configured to block a DUV light.