Photomasks Having Patterns for EUV light and Patterns for DUV light

摘要

A photomask substrate, a reflective layer formed on a front surface of the first area of the photomask substrate and reflecting EUV light, an absorption pattern formed on the reflective layer and absorbing the EUV light, A photomask is proposed that includes an opaque pattern formed directly on the front surface and blocking DUV light.