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METHOD FOR FORMING FINE PATTERN OF SEMICONDUCTOR DEVICE USING DOUBLE SPACER PATTERNING TECHNOLOGY
METHOD FOR FORMING FINE PATTERN OF SEMICONDUCTOR DEVICE USING DOUBLE SPACER PATTERNING TECHNOLOGY
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机译:利用双间隔图形化技术形成半导体器件精细图形的方法
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摘要
A method of forming a fine pattern of a semiconductor device using double SPT process, which is capable of implementing a line and space pattern having a uniform fine line width by applying a double SPT process including a negative SPT process, is provided. The method includes a first SPT process and a second SPT process and the second SPT process includes a Negative SPT process.
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