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Simple chemical vapor deposition systems for depositing multiple-metal aluminide coatings

机译:简单的化学气相沉积系统,用于沉积多金属铝化物涂层

摘要

A chemical vapor deposition (CVD) system and method for applying an aluminide coating constituted by two or more extrinsic metal components on a jet engine component. The aluminide coating is capable of forming a protective complex oxide upon subsequent heating in an oxidizing environment. At least one of the extrinsic metals in the aluminide coating is provided as a first vapor phase reactant from a receptacle coupled by a closed communication path with the reaction chamber of the CVD system and free of a carrier gas. The aluminide coating is formed by the chemical combination of the first vapor phase reactant with a second vapor phase reactant either created in situ in the reaction chamber or supplied by a carrier gas to the reaction chamber from a precursor source.
机译:化学气相沉积(CVD)系统和方法,用于将由两种或更多种非本征金属组分构成的铝化物涂层涂覆在喷气发动机部件上。在随后在氧化环境中加热时,铝化物涂层能够形成保护性复合氧化物。铝化物涂层中的至少一种非本征金属作为第一气相反应物从容器提供,该容器通过封闭的连通路径与CVD系统的反应室耦合且不含载气。铝化物涂层是由第一气相反应物与第二气相反应物的化学结合形成的,该第二气相反应物在反应室内就地产生,或由载气从前体源提供给反应室。

著录项

  • 公开/公告号US8839740B2

    专利类型

  • 公开/公告日2014-09-23

    原文格式PDF

  • 申请/专利权人 DAVID C. FAIRBOURN;

    申请/专利号US20080142539

  • 发明设计人 DAVID C. FAIRBOURN;

    申请日2008-06-19

  • 分类号C23C16/448;C23C16/02;C23C16/08;C23C28;

  • 国家 US

  • 入库时间 2022-08-21 16:04:39

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