首页> 外国专利> MASK ASSEMBLY FOR TESTING A DEPOSITION PROCESS, DEPOSITION APPARATUS INCLUDING THE MASK ASSEMBLY, AND TESTING METHOD FOR A DEPOSITION PROCESS USING THE MASK ASSEMBLY

MASK ASSEMBLY FOR TESTING A DEPOSITION PROCESS, DEPOSITION APPARATUS INCLUDING THE MASK ASSEMBLY, AND TESTING METHOD FOR A DEPOSITION PROCESS USING THE MASK ASSEMBLY

机译:用于测试沉积过程的掩模组件,包括该掩模组件的沉积装置以及使用该掩模组件的沉积过程的测试方法

摘要

A deposition apparatus includes deposition sources, a deposition chamber, a mask assembly, and a transfer unit. The mask assembly includes a support member, a shutter member, and a drive member. The support member has a first opening configured to allow the deposition materials to pass through while supporting the base substrate on which the passed-through deposition materials are deposited. The shutter member is accommodated in the support member and has a second opening smaller than the first opening. The drive member is configured to change a position of the second opening with respect to the base substrate in accordance with the movement of the mask assembly.
机译:沉积设备包括沉积源,沉积室,掩模组件和转印单元。面罩组件包括支撑构件,遮板构件和驱动构件。支撑构件具有第一开口,该第一开口构造成允许沉积材料通过,同时支撑其上沉积了通过的沉积材料的基础基板。活门构件容纳在支撑构件中并且具有小于第一开口的第二开口。驱动构件构造成根据掩模组件的运动来改变第二开口相对于基础基板的位置。

著录项

  • 公开/公告号US2014065293A1

    专利类型

  • 公开/公告日2014-03-06

    原文格式PDF

  • 申请/专利权人 SAMSUNG DISPLAY CO. LTD.;

    申请/专利号US201313794701

  • 发明设计人 MIN HO KIM;YOU MIN CHA;SEUK HWAN PARK;

    申请日2013-03-11

  • 分类号B05C3/20;

  • 国家 US

  • 入库时间 2022-08-21 16:03:12

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