TOPCOAT SURFACES FOR DIRECTING THE ASSEMBLY OF BLOCK COPOLYMER FILMS ON CHEMICALLY PATTERNED SURFACES

摘要

Provided are novel methods of fabricating block copolymer thin film structures that allow control over both the lateral structure and vertical orientation of the thin films. In some embodiments, the methods involve directing the assembly of a block copolymer thin film between a chemically patterned surface and a second surface such that the thin film includes domains that are oriented perpendicularly through the thickness of the thin film. In certain embodiments, the second surface can be preferential at least one block of the block copolymer. In certain embodiments, the second surface can be a homopolymer. Also provided are thin film block copolymer structures having perpendicular orientations through the thickness of the thin films. The methods and structures may include block copolymers having large interaction parameters (χ's) and small domain sizes.