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METHOD FOR FABRICATING PATTERNED SILICON NANOWIRE ARRAY AND SILICON MICROSTRUCTURE
METHOD FOR FABRICATING PATTERNED SILICON NANOWIRE ARRAY AND SILICON MICROSTRUCTURE
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机译:硅化纳米晶阵列和硅微结构的制备方法
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摘要
A method for fabricating a patterned silicon nanowire array is disclosed. The method includes: forming a patterned protective layer on silicon nanowire array structures, forming a patterned protective layer on the array of silicon nanowire structures, the patterned protective layer defining a covered region and a uncovered region on the array of silicon nanowire structures; using a selective etching to remove the array of silicon nanowire structures defined on the uncovered region; and removing the patterned protective layer remained on the array of silicon nanowire structures. A method for fabricating a silicon microstructure is also disclosed.
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