首页> 外国专利> NEW SOLAR CELL EMTTER CONTACT GRID FORMING METHOD USING THE FULL CHEMICAL METALLIZATION COATING METHOD

NEW SOLAR CELL EMTTER CONTACT GRID FORMING METHOD USING THE FULL CHEMICAL METALLIZATION COATING METHOD

机译:全化学镀膜方法形成的新型太阳能电池电汇接触网形成方法

摘要

The invention relates to the field of semiconductor devices, particularly in relation to the solar cells. This invention is a method to produce solar cell emitter grid, with low resistance and good adhesion at which can be easily connected to the connecting cables. To realize this aim, instead of silver creates two layers of nickel and copper chemically coated coating which covered Ni performs ohmic contact function of silicon and copper layer reduces the resistance of the grid. This allows reduce emitter alloying level and increase solar cell efficiency. This solar cell has the following characteristics: a lower cost; easier availability of used items; significantly lower grid tracks that not contouring thin solar cell plates and practically does not shadow, volume; opportunity to thin solar cells.
机译:本发明涉及半导体器件领域,特别是涉及太阳能电池。本发明是一种制造太阳能电池发射极格栅的方法,该太阳能电池发射极格栅具有低电阻和良好的粘附性,在该处可以容易地连接至连接电缆。为了实现该目标,代替银而创建两层镍和铜化学涂层,该涂层覆盖了镍,从而实现了硅的欧姆接触功能,而铜层则降低了栅极的电阻。这允许降低发射极合金化水平并提高太阳能电池效率。该太阳能电池具有以下特征:成本低;更容易获得二手物品;显着降低的网格线不会使薄薄的太阳能电池板轮廓化,并且几乎不会遮挡体积;减薄太阳能电池的机会。

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