首页> 外国专利> MATERIALS AND METHODS FOR CARRYING OUT GRADUAL AND COMPLEX TRIBOLOGIC LAYERS IN VACUUM FOR COATING METAL OBJECTS SUBJECTED TO FRICTION

MATERIALS AND METHODS FOR CARRYING OUT GRADUAL AND COMPLEX TRIBOLOGIC LAYERS IN VACUUM FOR COATING METAL OBJECTS SUBJECTED TO FRICTION

机译:在真空中进行梯度涂覆的复杂的摩擦层的材料和方法,用于涂覆受摩擦的金属物体

摘要

The invention relates to materials and methods for carrying out gradual complex tribologic layers made of 2...5 different materials, used for coating metal pieces subjected to friction, namely friction couplings, the materials conferring on the coated pieces an increased tenacity and hardness, an increased thermal and chemical stability, as well as a reduced friction coefficient. According to the invention, the materials comprise 2, 3, 4 or 5 materials, as follows: TiN + WS, TiCN + WS, TiAlN + MoS, C + WS, TiN + AlO+ WS, TiCN + BN + WS, TiAlN + C + WS, TiN + AlO+ C +WS, TiAlN + BN +AlO+ WS, TiC +BAM + C + WS, Ti + c/h_BN + AlO+WS, Al + TiN +BCN + YO+ C + MoS, W + TiCN + WB+ ZrO+ WSand the like. As claimed by the invention, the method has a single technological cycle and it is carried out in an installation for depositing the thin layers under vacuum, said installation being provided with 2...5 sources of vacuum deposition of the thin layers such as magnetrons of the Penning type sputtering cathodes, electric arc evaporation cathodes or PLD targets, by using economical and non-polluting methods of the type: "Standard Magnetron Sputtering", "Reactive Magnetron Sputtering", "High Power Pulsed Magnetron Sputtering", "Standard Cathodic Arc Evaporation", "Pulsed Laser Deposition", "Standard Electric Arc Vapour Deposition" or the like, so that they allow a multitude of coating types to be obtained where the tribologic layer properties depend on the concentration variation of the materials comprised by the tribologic layer.
机译:本发明涉及用于执行由2 ... 5种不同材料制成的逐渐复杂的摩擦学层的材料和方法,该材料和方法用于涂覆经受摩擦的金属件,即摩擦偶合,该材料赋予涂覆的件以更高的强度和硬度,增加的热稳定性和化学稳定性,以及降低的摩擦系数。根据本发明,材料包括如下的2、3、4或5种材料:TiN + WS,TiCN + WS,TiAlN + MoS,C + WS,TiN + AlO + WS,TiCN + BN + WS,TiAlN + C + WS,TiN + AlO + C + WS,TiAlN + BN + AlO + WS,TiC + BAM + C + WS,Ti + c / h_BN + AlO + WS,Al + TiN + BCN + YO + C + MoS,W + TiCN + WB + ZrO + WS等。如本发明所要求的,该方法具有单个工艺周期,并且该方法在用于在真空下沉积薄层的设备中进行,所述设备设有2 ... 5个薄层真空沉积源,例如磁控管。潘宁型溅射阴极,电弧蒸发阴极或PLD靶,通过使用以下类型的经济且无污染的方法:“标准磁控溅射”,“反应磁控溅射”,“大功率脉冲磁控溅射”,“标准阴极”电弧蒸发”,“脉冲激光沉积”,“标准电弧气相沉积”等,这样它们就可以得到多种涂层类型,其中摩擦学层的性能取决于摩擦学所含材料的浓度变化层。

著录项

  • 公开/公告号RO129650A2

    专利类型

  • 公开/公告日2014-07-30

    原文格式PDF

  • 申请/专利权人 AEG PROGRESIV S.R.L.;

    申请/专利号RO20120001075

  • 发明设计人 MATEESCU GHEORGHE;MATEESCU ALICE-ORTANSA;

    申请日2012-12-28

  • 分类号C23C14/35;

  • 国家 RO

  • 入库时间 2022-08-21 15:56:22

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