首页> 外国专利> Method for producing silicon fine particles and method for controlling particle diameter of silicon fine particles

Method for producing silicon fine particles and method for controlling particle diameter of silicon fine particles

机译:硅微粒的制造方法和硅微粒的粒径控制方法

摘要

The present invention addresses the aims and problems of providing a method of producing silicon fine particles and a method of controlling the particle size of silicon fine particles, which enable silicon fine particles having a uniform particle size to be efficiently produced. The present invention is characterized in that silicon particles are immersed in an etching solution, a light having greater energy than the band gap energy of the silicon particles is irradiated onto the silicon particles immersed in the etching solution, and thereby silicon fine particles with a smaller particle size than the silicon particles are produced while controlling the particle size.
机译:本发明解决了提供一种生产硅细颗粒的方法和一种控制硅细颗粒的粒径的方法的目的和问题,这些方法使得能够有效地生产具有均匀粒径的硅细颗粒。本发明的特征在于,将硅粒子浸渍在蚀刻液中,将能量比该硅粒子的带隙能量大的光照射到浸渍在该蚀刻液中的硅粒子上,从而硅粒子的粒径变小。在控制粒度的同时,产生比硅颗粒更小的粒度。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号