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Method of producing hollow silicone fine particles

机译:中空硅酮微粒的制造方法

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摘要

There is interest in producing anti-reflective surfaces by a wet coating method. Methods of preparing hollow silica particles with a particle diameter of 0.1-300pm have been known for many years. However, hollow silica can easily break during a coating process or during use. Additionally the method of preparation is long with a large number of steps and the resulting particles have a wide particle size distribution.This patent describes a method of preparing hollow silicone fine particles with low breakability, a volume average particle diameter of less than 1pm and a narrow particle size distribution.
机译:通过湿涂法生产抗反射表面是令人感兴趣的。制备粒径为0.1-300pm的中空二氧化硅颗粒的方法已为人们所知。但是,中空二氧化硅在涂覆过程中或使用过程中容易破裂。另外,制备方法长且步骤繁多,并且所得颗粒具有宽的粒度分布。该专利描述了一种制备具有低易碎性,体积平均粒径小于1pm且粒径小于1pm的中空有机硅细颗粒的方法。粒度分布窄。

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