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MICRO-STRUCTURE BODY FABRICATION METHOD, AND MICRO-STRUCTURE BODY

机译:微结构体的制造方法及微结构体

摘要

Provided is a micro-structure body fabrication method, having a photoresist pattern forming step, whereby a gradation of a laser beam intensity is substantially increased with a simple method at photoresist exposure time, and it is possible to improve resolution. A photoresist pattern forming step is carried out wherein a photoresist pattern is formed, said photoresist pattern having an unevenness pattern upon the surface thereof, by illuminating, with a laser, a positive photoresist which is coated upon a substrate and exposing the photoresist, and developing the photoresist. Multiple exposures are carried out over a plurality of iterations, with an exposure which modulates a laser beam quantity by an in-surface location of the substrate with a gradation pattern setting in which the relationship between the in-surface location of the substrate and the laser beam quantity varies, and the unevenness pattern is formed post-development according to a total exposure quantity of the multiple exposures.
机译:提供了一种微结构体的制造方法,该方法具有光致抗蚀剂图案形成步骤,从而可以通过简单的方法在光致抗蚀剂曝光时实质上提高激光束强度的灰度,并且可以提高分辨率。进行光致抗蚀剂图案形成步骤,其中形成光致抗蚀剂图案,所述光致抗蚀剂图案通过用激光照射涂覆在基板上的正性光致抗蚀剂并曝光该光致抗蚀剂并显影而在其表面上具有凹凸图案。光刻胶。多次曝光进行多次曝光,其中曝光通过渐变图案设置通过基板的表面内位置调制激光束量,在渐变图案设置中,基板的表面内位置与激光器之间的关系光束量变化,并且根据多次曝光的总曝光量在显影后形成凹凸图案。

著录项

  • 公开/公告号WO2014054250A1

    专利类型

  • 公开/公告日2014-04-10

    原文格式PDF

  • 申请/专利权人 KURARAY CO. LTD.;

    申请/专利号WO2013JP05711

  • 发明设计人 WATANABE JUNJI;KARAI MASARU;

    申请日2013-09-26

  • 分类号G03F7/20;B29C59/02;H01L21/027;

  • 国家 WO

  • 入库时间 2022-08-21 15:50:28

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