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MICRO-STRUCTURE BODY FABRICATION METHOD, AND MICRO-STRUCTURE BODY

机译:微结构体的制造方法及微结构体

摘要

Provided is a microstructure production method which includes a photoresist pattern forming step and is capable of substantially increasing the number of gradations of a laser light intensity by a simple method during exposure of a photoresist, to thereby improve the resolution. The photoresist pattern forming step of irradiating a positive photoresist applied onto a base material with laser light to expose the photoresist to light, and developing the photoresist, thereby forming a photoresist pattern having a surface patterned with a concave and convex is carried out. An overlay exposure process in which exposure for modulating an amount of laser light depending on an in-plane position of the base material is carried out multiple times is performed by setting gradation patterns with different relations between the in-plane position of the base material and the amount of laser light, and the concave and convex pattern according to a total amount of exposure in the overlay exposure process is formed after developing the photoresist.
机译:提供一种微结构的制造方法,其包括光致抗蚀剂图案形成步骤,并且能够在光致抗蚀剂的曝光期间通过简单的方法实质上增加激光强度的灰度级数,从而提高分辨率。进行光致抗蚀剂图案形成步骤,通过用激光照射施加在基材上的正性光致抗蚀剂以使光致抗蚀剂曝光并显影该光致抗蚀剂,从而形成具有被凹凸图案化的表面的光致抗蚀剂图案。通过设置具有在基材的平面内位置与基材的内表面位置之间的不同关系的灰度图案,来执行多次曝光的曝光处理,其中根据基材的面内位置进行用于调制激光的量的曝光。在对光致抗蚀剂进行显影之后,形成激光的量以及根据覆盖曝光工艺中的曝光总量的凹凸图案。

著录项

  • 公开/公告号EP2908175A1

    专利类型

  • 公开/公告日2015-08-19

    原文格式PDF

  • 申请/专利权人 KURARAY CO. LTD.;

    申请/专利号EP20130843299

  • 发明设计人 WATANABE JUNJI;KARAI MASARU;

    申请日2013-09-26

  • 分类号G03F7/20;B29C59/02;H01L21/027;

  • 国家 EP

  • 入库时间 2022-08-21 15:02:07

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