首页> 外国专利> METHOD OF IMPLEMENTING A FERROELECTRIC TUNNEL JUNCTION, DEVICE COMPRISING A FERROELECTRIC TUNNEL JUNCTION AND USE OF SUCH A DEVICE

METHOD OF IMPLEMENTING A FERROELECTRIC TUNNEL JUNCTION, DEVICE COMPRISING A FERROELECTRIC TUNNEL JUNCTION AND USE OF SUCH A DEVICE

机译:实施铁电隧道结的方法,包括铁电隧道结的设备以及此类设备的使用

摘要

The invention relates to a method of implementing a ferroelectric tunnel junction, said junction comprising to films each forming an electrode-type conductive element, and separated by a film forming a ferroelectric element acting as the tunnel barrier, said ferroelectric element being able to possess a remanent polarization. According to the invention, the ferroelectric element possesses a domain structure, said domains corresponding to regions of the ferroelectric element the polarization of which is oriented one way in a single direction; and when a voltage is applied between the electrodes, the absolute value of the voltage being equal to or higher than the absolute value of what is called a saturation voltage, the ferroelectric element main comprises only a single domain; and when a voltage is applied between the electrodes, the absolute value of the voltage being lower than the absolute value of what is called the saturation voltage, the ferroelectric element comprises a plurality of separate domains, the spatial distribution of said domains and their proportions being controlled by the chosen voltage value.
机译:本发明涉及一种实现铁电隧道结的方法,所述结包括分别形成电极型导电元件的膜,并被形成用作隧道势垒的铁电元件的膜隔开,所述铁电元件能够具有剩余极化。根据本发明,铁电元件具有畴结构,所述畴对应于铁电元件的极化方向在单个方向上定向的区域;当在电极之间施加电压时,该电压的绝对值等于或高于所谓的饱和电压的绝对值,则铁电元件main仅包括一个畴。并且当在电极之间施加电压时,电压的绝对值低于所谓的饱和电压的绝对值,铁电元件包括​​多个单独的畴,所述畴的空间分布及其比例为由所选电压值控制。

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