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Microcrystalline silicon thin film PECVD using hydrogen and silanes mixtures
Microcrystalline silicon thin film PECVD using hydrogen and silanes mixtures
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机译:使用氢和硅烷混合物的微晶硅薄膜PECVD
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摘要
This invention describes the improvement of silicon thin film deposition, more specifically the capability to deposit microcrystalline silicon thin film which properties are suitable for a photovoltaic application in a tandem structure at increased deposition rate. This deposition is carried out under "soft" deposition conditions which are finely tuned, including mixtures of hydrogen and silanes.
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