首页> 外国专利> EMBEDDING RESIN COMPOSITION FOR ELECTRON MICROSCOPE, AND METHOD FOR OBSERVING SAMPLE ON ELECTRON MICROSCOPE USING SAID COMPOSITION

EMBEDDING RESIN COMPOSITION FOR ELECTRON MICROSCOPE, AND METHOD FOR OBSERVING SAMPLE ON ELECTRON MICROSCOPE USING SAID COMPOSITION

机译:用于电子显微镜的嵌入式树脂组合物以及使用所述组合物观察电子显微镜上的样品的方法

摘要

The present invention provides an embedding resin composition for electron microscopy having satisfactory performance as an embedding medium, including embedding performance and sectioning quality, and exhibiting excellent antistatic performance; and a method for observing a sample with an electron microscope using the composition. The embedding resin composition for electron microscopy of the present invention having antistatic performance comprises an ionic liquid and an embedding medium comprising an epoxy-based resin, a methacrylate resin or an unsaturated polyester resin. Preferably, the ionic liquid comprisinga quaternary ammonium compound based on the formula (I):andan anion selected from the group consisting of BF4-, PF6-, (CF3SO2)2N-, a halide ion, a conjugate base of carboxylic acid, a conjugate base of sulfonic acid and a conjugate base of an inorganic acid.
机译:本发明提供了一种电子显微镜用包埋树脂组合物,其具有良好的作为包埋介质的性能,包括包埋性能和切片质量,并且具有优异的抗静电性能。以及使用该组合物的电子显微镜观察样品的方法。具有抗静电性能的本发明的电子显微镜用包埋树脂组合物包含离子液体和包埋介质,所述包埋介质包含环氧基树脂,甲基丙烯酸酯树脂或不饱和聚酯树脂。优选地,离子液体包括基于式(I)的季铵化合物:和选自BF4-,PF6-,(CF3SO2)2N-,卤离子,羧酸的共轭碱,磺酸的共轭碱和无机酸的共轭碱的阴离子。

著录项

  • 公开/公告号EP2754693A1

    专利类型

  • 公开/公告日2014-07-16

    原文格式PDF

  • 申请/专利权人 KURUME UNIVERSITY;

    申请/专利号EP20120830712

  • 发明设计人 KIRYU TOSHIYUKI;OHTA KEISUKE;

    申请日2012-09-04

  • 分类号C08L63/00;G01N1/28;G01N23/225;

  • 国家 EP

  • 入库时间 2022-08-21 15:45:28

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号