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首页> 外文期刊>Scanning >Can X-ray Spectrum Imaging Replace Backscattered Electrons for Compositional Contrast in the Scanning Electron Microscope?
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Can X-ray Spectrum Imaging Replace Backscattered Electrons for Compositional Contrast in the Scanning Electron Microscope?

机译:X射线光谱成像能否代替反向散射电子以在扫描电子显微镜中进行成分对比?

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摘要

The high throughput of the silicon drift detector energy dispersive X-ray spectrometer (SDD-EDS) enables X-ray spectrum imaging (XSI) in the scanning electron microscope to be performed in frame times of 10-100 s, the typical time needed to record a high-quality backscattered electron (BSE) image. These short-duration XSIs can reveal all elements, except H, He, and Li, present as major constituents, defined as 0.1 mass fraction (10 wt%) or higher, as well as minor constituents in the range 0.01-0.1 mass fraction, depending on the particular composition and possible interferences. Although BSEs have a greater abundance by a factor of 100 compared with characteristic X-rays, the strong compositional contrast in element-specific X-ray maps enables XSI mapping to compete with BSE imaging to reveal compositional features. Differences in the fraction of the interaction volume sampled by the BSE and X-ray signals lead to more delocaliza-tion of the X-ray signal at abrupt compositional boundaries, resulting in poorer spatial resolution. Improved resolution in X-ray elemental maps occurs for the case of a small feature composed of intermediate to high atomic number elements embedded in a matrix of lower atomic number elements. XSI imaging strongly complements BSE imaging, and the SDD-EDS technology enables an efficient combined BSE-XSI measurement strategy that maximizes the compositional information. If 10 s or more are available for the measurement of an area of interest, the analyst should always record the combined BSE-XSI information to gain the advantages of both measures of compositional contrast.
机译:硅漂移检测器能量色散X射线光谱仪(SDD-EDS)的高通量使扫描电子显微镜中的X射线光谱成像(XSI)可以在10-100 s的帧时间内完成,这通常是记录高质量的背向散射电子(BSE)图像。这些短期XSI可以显示除H,He和Li以外的所有元素,它们是主要成分,定义为0.1质量分数(10 wt%)或更高,以及次要成分范围为0.01-0.1质量分数,取决于特定的成分和可能的干扰。尽管与特征性X射线相比,BSE的丰度高100倍,但是特定于元素的X射线图中的强成分对比使XSI映射可以与BSE成像竞争以揭示成分。 BSE和X射线信号采样的相互作用体积分数的差异导致X射线信号在突然的成分边界处发生更多的离域,从而导致较差的空间分辨率。对于由嵌入到较低原子序数元素的矩阵中的中高原子序数元素组成的小特征,X射线元素图的分辨率得到了改善。 XSI成像是BSE成像的有力补充,而SDD-EDS技术可实现有效的BSE-XSI组合测量策略,从而最大限度地提高成分信息。如果有10 s或更长的时间可用于感兴趣区域的测量,则分析人员应始终记录组合的BSE-XSI信息,以获得两种构图对比度测量的优势。

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