PHOTOACID GENERATOR, PHOTORESIST COMPRISING THE PHOTOACID GENERATOR, AND COATED ARTICLE COMPRISING SAME

摘要

Disclosed is a compound denoted by chemical formula I. In the chemical formula I: R1 is H or a substituted or non-substituted C1-40 aliphatic group which is randomly combined to close R1, independently; and R2 and R3 are H, F, C1-10 alkyl, C1-10 fluoroalkyl, C3-10 cycloalkyl, or C3-10 fluorocycloalkyl, independently. A photoresist includes a photoacid generator, and a coated article contains the photoresist. A user can form a device using the photoresist.