PHOTOACID GENERATOR, PHOTORESIST COMPRISING THE PHOTOACID GENERATOR, AND COATED ARTICLE COMPRISING SAME

摘要

A compound having the formula (I): Wherein R ¹ is each independently a substituted or unsubstituted C _1-30 aliphatic group optionally bonded to H or adjacent R ¹ , R ² and R ³ are each independently H, F, C _1-10 alkyl , (at least one of R ² and / or R ³ here is contained F) to _-10 C ₁ fluoroalkyl, C _3-10 cycloalkyl or C _3-10 cycloalkyl, fluoroalkyl, L ^1, L ² And L ³ are each independently a single bond or, optionally, a C _1-20 bond group comprising a lactone group, One or more of L ¹ , L ² and L ³ optionally form a cyclic structure and at least one of L ¹ , L ² and L ³ is optionally substituted with a polymerized C _2-20 alpha -beta unsaturated organic group; X is an ether , ester, carbonate, amine, amide, urea, sulfate, and sulfonate, or sulfonamide-containing group, Z ⁺ is an organic or inorganic cation, and, a is each independently an integer from 0 to 12, b is from 0 to 5 C, d, and r are each independently 0 or 1, p is an integer of 0 to 10, and q is an integer of 1 to 10. The photoresist comprises a photoacid generator and the coated article comprises a photoresist. Photoresists can be used to form the equipment.