DEVICE FOR DEPOSITING THIN FILM AND METHOD FOR DEPOSITING THIN FILM BY USING DEVICE FOR DEPOSITING THIN FILM

摘要

A device for depositing a thin film comprises: a process chamber having a reaction space therein; a plasma generating unit; and a sputter unit. The plasma generating unit generates plasma inside the reaction space. The sputter unit is driven separately from the plasma generating unit; forms a magnetic field inside the reaction space; and uses the plasma to perform a sputtering process for a target.;COPYRIGHT KIPO 2014