首页> 外国专利> GAS DISTRIBUTION ASSEMBLY HAVING EXTENDED GAS DISTRIBUTION PLATE AND CHEMICAL VAPOR DEPOSITION APPARATUS

GAS DISTRIBUTION ASSEMBLY HAVING EXTENDED GAS DISTRIBUTION PLATE AND CHEMICAL VAPOR DEPOSITION APPARATUS

机译:气体分配组件具有扩展的气体分配板和化学气相沉积装置

摘要

A gas distribution assembly having an extended gas distribution plate and a chemical vapor deposition apparatus are provided. The present invention includes a back plate; a gas distribution plate which is located in a lower part of the back plate and has multiple spray holes; and a support member for supporting the gas distribution plate by being connected to the back plate, wherein the gas distribution plate includes four sides and an extension unit which is outwardly extended at a corner unit formed in between the four sides. According to the present invention, a deposition layer with uniform thickness can be formed over the entire surface for a large scale substrate.;COPYRIGHT KIPO 2014
机译:提供了具有延伸的气体分配板的气体分配组件和化学气相沉积设备。本发明包括背板;气体分配板,其位于背板的下部且具有多个喷孔;气体分配板包括四个侧面和延伸单元,该延伸单元在形成在四个侧面之间的拐角单元处向外延伸。根据本发明,可以在用于大型基板的整个表面上形成厚度均匀的沉积层。; COPYRIGHT KIPO 2014

著录项

  • 公开/公告号KR20140052227A

    专利类型

  • 公开/公告日2014-05-07

    原文格式PDF

  • 申请/专利权人 SFA ENGINEERING CORP.;

    申请/专利号KR20120117934

  • 发明设计人 PARK SANG TAEKR;SHIN SUNG DUCKKR;

    申请日2012-10-23

  • 分类号C23C16/455;C23C16/44;

  • 国家 KR

  • 入库时间 2022-08-21 15:43:05

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