Gas distribution assembly and chemical vapor deposition apparatus including gas distribution plate expanded

摘要

is the gas distribution assembly and a chemical vapor deposition apparatus is disclosed that includes an expanded gas distribution plate. The present invention , the back plate ; Is disposed in a lower portion of the rear plate , the gas distribution plate having a plurality of injection hole; And the back plate support member for supporting said gas distribution plate to connect to ; includes , the gas distribution plate extends in the outward direction at the corner portion formed between the four sides and four sides including a extension formed which is characterized in that . Can form a deposition layer having a uniform thickness in the entire region of the substrate surface with respect to the large-sized substrate according to the present invention . ;