LARGE-SIZED PHASE-SHIFT MASK, AND METHOD FOR PRODUCING LARGE-SIZED PHASE-SHIFT MASK

摘要

in the formation of a photomask for exposing an area of a large size , configuration suitable for forming a fine pattern It provides a phase shift mask and a method of manufacturing the same. And light-shielding film composed mainly of chromium or a chromium compound , a phase shift film composed mainly of chromium oxide or chromium nitride , and the light shielding region in the stacked configuration by a phase shift film on the light-shielding film , the manufacturing is easy , and transfer a fine pattern possible to obtain a large phase shift mask . In addition , an anti-reflection film made of chromium compounds in the light-shielding film and the phase shift between the reflectance of the light-shielding film is also inhibited area having a configuration . ;