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DEVICES INCLUDING GRAPHENE LAYERS EPITAXIALLY GROWN ON SINGLE CRYSTAL SUBSTRATES

机译:在单个晶体基底上包括石墨烯表观生长的器件

摘要

Electronic device according to the present invention is a single crystal on its major surface area-single-crystal region is yes also provided with a hexagonal crystal lattice of a substantially lattice-matched to the pin - the body, including, at least one epitaxially disposed on the single-crystal region Yes epitaxial layer provided with a pin. In the presently preferred embodiment, the single crystal region includes hexagonal BN a double layer. (A) their main surfaces onto a single-crystal region, the region is yes also provided with a substantially lattice matched hexagonal crystal lattice with respect to the pin - providing the body containing and, (b) at least one in-phase region for yes and forming a pinned layer epitaxially. In the presently preferred embodiment, step (a) further comprises the step (a2) to a single crystal hexagonal BN of the multi-layer epitaxially forming on the step (a1) and the substrate to provide a single-crystal graphite substrate. Hexagonal BN layer is yes, and provided with a substantially lattice-matched to the surface area of ​​the pin, in step (b) comprises at least one graphene layer on the surface area of ​​the hexagonal BN layer is formed epitaxially. In the present specification it has also been described in applications for the FET.
机译:根据本发明的电子设备是在其主表面区域上的单晶-单晶区域,是的,还设有与销-主体基本晶格匹配的六方晶格,包括至少一个外延设置的在单晶区域的是外延层上设有pin。在当前优选的实施例中,单晶区域包括六角形BN双层。 (A)它们的主表面位于单晶区域上,是的,该区域还相对于销具有基本上晶格匹配的六方晶格-提供主体,并且(b)至少一个同相区域用于是的,并外延形成被钉扎层。在当前优选的实施方式中,步骤(a)还包括步骤(a2),以在步骤(a1)和衬底上外延形成多层的单晶六角形BN,从而提供单晶石墨衬底。六角形BN层为是,并且与销的表面积基本晶格匹配,在步骤(b)中包含至少一个石墨烯层,该六角形BN层的外延形成。在本说明书中,也已经在FET的应用中进行了描述。

著录项

  • 公开/公告号KR101351691B1

    专利类型

  • 公开/公告日2014-01-14

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20087019823

  • 发明设计人 페이퍼 로렌 네일;

    申请日2007-02-13

  • 分类号H01L21/20;H01L21/336;H01L29/78;

  • 国家 KR

  • 入库时间 2022-08-21 15:41:40

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